Characterization of in-depth cavity distribution after...

Thin Solid Films 2014 / 11 Vol. 571

Characterization of in-depth cavity distribution after thermal annealing of helium-implanted silicon and gallium nitride

Fodor, B., Cayrel, F., Agocs, E., Alquier, D., Fried, M., Petrik, P.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
571
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2014.02.014
Date:
November, 2014
File:
PDF, 1.02 MB
english, 2014
Conversion to is in progress
Conversion to is failed