Simulation model validation of two common i-line photoresists
Partel, S., Urban, G.A., Motzek, K.Volume:
110
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.01.054
Date:
October, 2013
File:
PDF, 1.09 MB
english, 2013