Characterization of HfBx films deposited by r.f. diode and r.f. magnetron sputtering
W.Y. Lee, G. Olive, F. Sequeda, V. Deline, T. Huang, G. Gorman, D.W. ChungVolume:
166
Year:
1988
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(88)90373-2
File:
PDF, 430 KB
english, 1988