![](/img/cover-not-exists.png)
Factorial experimental investigation of plasma-enhanced chemical vapor deposition of silicon nitride thin films
C.-S. Yoo, A.G. DixonVolume:
168
Year:
1989
Language:
english
Pages:
9
DOI:
10.1016/0040-6090(89)90013-8
File:
PDF, 382 KB
english, 1989