Film modification by low energy ion bombardment during...

Thin Solid Films 1989 Vol. 171; Iss. 1

Film modification by low energy ion bombardment during deposition

S.M. Rossnagel, J.J. Cuomo
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Volume:
171
Year:
1989
Language:
english
Pages:
14
DOI:
10.1016/0040-6090(89)90040-0
File:
PDF, 823 KB
english, 1989
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