Volume 171; Issue 1

Thin Solid Films

Volume 171; Issue 1
1

Editorial Board

Year:
1989
File:
PDF, 30 KB
1989
2

Professor John A. Thornton

Year:
1989
Language:
english
File:
PDF, 100 KB
english, 1989
3

Testimonial

Year:
1989
Language:
english
File:
PDF, 57 KB
english, 1989
4

Professor Chr. Weissmantel

Year:
1989
Language:
english
File:
PDF, 103 KB
english, 1989
5

Stress-related effects in thin films

Year:
1989
Language:
english
File:
PDF, 1.41 MB
english, 1989
6

On the relations between the δ-Cr and α-Cr phases

Year:
1989
Language:
english
File:
PDF, 949 KB
english, 1989
9

Mass spectrometric studies of positive ions in r.f. glow discharges

Year:
1989
Language:
english
File:
PDF, 807 KB
english, 1989
10

Note on the origin of intrinsic stresses in films deposited via evaporation and sputtering

Year:
1989
Language:
english
File:
PDF, 804 KB
english, 1989
11

Adhesion measurement of thin films on glass substrates

Year:
1989
Language:
english
File:
PDF, 317 KB
english, 1989
12

Early days of magnetron sputtering—an enigma

Year:
1989
Language:
english
File:
PDF, 583 KB
english, 1989
13

Growth of CuInSe2 by two magnetron sputtering techniques

Year:
1989
Language:
english
File:
PDF, 857 KB
english, 1989
14

Magnetron plasma deposition processes

Year:
1989
Language:
english
File:
PDF, 878 KB
english, 1989
15

Film modification by low energy ion bombardment during deposition

Year:
1989
Language:
english
File:
PDF, 823 KB
english, 1989
18

Strain, ion bombardment and energetic neutrals in magnetron sputtering

Year:
1989
Language:
english
File:
PDF, 556 KB
english, 1989
19

Residual stress in physically vapor deposited films: A study of deviations from elastic behavior

Year:
1989
Language:
english
File:
PDF, 1.02 MB
english, 1989