Recrystallization of silicon-on-insulator layers in pulsed...

Thin Solid Films 1989 Vol. 171; Iss. 1

Recrystallization of silicon-on-insulator layers in pulsed nanosecond heating (model calculations)

L.N. Aleksandrov, V.Yu. Balandin, A.V. Dvurechenskii, O.A. Kulyasova
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Volume:
171
Year:
1989
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(89)90046-1
File:
PDF, 442 KB
english, 1989
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