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Non-destructive depth profiling of silicon ion implantation induced damage in silicon (100) substrates
S. Lynch, M. Murtagh, G.M. Crean, P.V. Kelly, M. O'Connor, C. JeynesVolume:
233
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(93)90089-8
File:
PDF, 346 KB
english, 1993