Electron cyclotron resonance etching of semiconductor...

Thin Solid Films 1993 Vol. 233; Iss. 1-2

Electron cyclotron resonance etching of semiconductor structures studied by in-situ spectroscopic ellipsometry

Suraiya Nafis, Natale J. Ianno, Paul G. Snyder, William A. McGahan, Blaine Johs, John A. Woollam
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Volume:
233
Year:
1993
Language:
english
Pages:
3
DOI:
10.1016/0040-6090(93)90101-t
File:
PDF, 238 KB
english, 1993
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