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Novel method for chemical vapor deposition and atomic layer epitaxy using radical chemistry
Terttu I. Hukka, Robin E. Rawles, Mark P. D'EvelynVolume:
225
Year:
1993
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(93)90157-k
File:
PDF, 644 KB
english, 1993