Layered tantalum-aluminum oxide films deposited by atomic layer epitaxy
H. Kattelus, M. Ylilammi, J. Saarilahti, J. Antson, S. LindforsVolume:
225
Year:
1993
Language:
english
Pages:
3
DOI:
10.1016/0040-6090(93)90173-m
File:
PDF, 223 KB
english, 1993