Chemical vapour deposition tungsten film growth studied by in situ growth stress measurements
G.J. Leusink, T.G.M. Oosterlaken, G.C.A.M. Janssen, S. RedelaarVolume:
228
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(93)90579-e
File:
PDF, 349 KB
english, 1993