Effects of activated reactive evaporation process parameters on the microhardness of polycrystalline silicon carbide thin films
YongHwa Chris Cha, Guho Kim, Hans J. Doerr, Rointan F. BunshahVolume:
253
Year:
1994
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(94)90322-0
File:
PDF, 552 KB
english, 1994