Effects of activated reactive evaporation process...

Effects of activated reactive evaporation process parameters on the microhardness of polycrystalline silicon carbide thin films

YongHwa Chris Cha, Guho Kim, Hans J. Doerr, Rointan F. Bunshah
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Volume:
253
Year:
1994
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(94)90322-0
File:
PDF, 552 KB
english, 1994
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