Study of the material properties and suitability of plasma-deposited fluorine-doped silicon dioxides for low dielectric constant interlevel dielectrics
V.L. Shannon, M.Z. KarimVolume:
270
Year:
1995
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(95)06704-3
File:
PDF, 497 KB
english, 1995