Chemical and electrical characteristics of low temperature plasma enhanced CVD silicon oxide films using Si2H6 and N2O
Juho Song, G.S. Lee, P.K. AjmeraVolume:
270
Year:
1995
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(95)06746-9
File:
PDF, 506 KB
english, 1995