Chemical and electrical characteristics of low temperature...

Chemical and electrical characteristics of low temperature plasma enhanced CVD silicon oxide films using Si2H6 and N2O

Juho Song, G.S. Lee, P.K. Ajmera
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Volume:
270
Year:
1995
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(95)06746-9
File:
PDF, 506 KB
english, 1995
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