0.10 μm TiSi2 technology utilizing nitrogen diffusion controlled RTA
Y. Matsubara, T. Sakai, T. Ishigami, K. Ando, T. HoriuchiVolume:
270
Year:
1995
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(95)06838-4
File:
PDF, 904 KB
english, 1995