Morphology and stability of (Ti0.9Zr0.1) Si2 thin films on Si(111) and Si(100) formed in UHV
Y. Dao, D.E. Sayers, R.J. NemanichVolume:
270
Year:
1995
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(95)06843-0
File:
PDF, 678 KB
english, 1995