Effect of process parameter changes on the composition of magnetron sputtered and evaporated TiN and AlN films measured by UHV in-situ techniques
R. Roth, J. Schubert, M. Martin, E. FrommVolume:
270
Year:
1995
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(95)06935-6
File:
PDF, 518 KB
english, 1995