Enhanced selectivity over a photoresist film and process...

Microelectronic Engineering 2014 / 1 Vol. 113

Enhanced selectivity over a photoresist film and process optimization for reactive ion etching of NiCr

Gou, Jun, Wang, Jun, Tai, Huiling, Li, Weizhi, Gu, Deen, Jiang, Yadong
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Volume:
113
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.08.003
Date:
January, 2014
File:
PDF, 1.04 MB
english, 2014
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