Inductively Coupled Plasma etching of amorphous silicon...

Microelectronic Engineering 2013 / 10 Vol. 110

Inductively Coupled Plasma etching of amorphous silicon nanostructures over nanotopography using C4F8/SF6 chemistry

Harvey-Collard, Patrick, Jaouad, Abdelatif, Drouin, Dominique, Pioro-Ladrière, Michel
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Volume:
110
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.02.099
Date:
October, 2013
File:
PDF, 1.33 MB
english, 2013
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