Strain engineering of ultra-thin silicon-on-insulator structures using through-buried-oxide ion implantation and crystallization
Ding, Yinjie, Cheng, Ran, Zhou, Qian, Du, Anyan, Daval, Nicolas, Nguyen, Bich-Yen, Yeo, Yee-ChiaVolume:
83
Language:
english
Journal:
Solid-State Electronics
DOI:
10.1016/j.sse.2013.01.027
Date:
May, 2013
File:
PDF, 1.32 MB
english, 2013