The impact of interface/border defect on performance and...

Microelectronics Reliability 2013 / 2 Vol. 53; Iss. 2

The impact of interface/border defect on performance and reliability of high-k/metal-gate CMOSFET

Yeh, Wen-Kuan, Chen, Po-Ying, Gan, Kwang-Jow, Wang, Jer-Chyi, Lai, Chao Sung
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Volume:
53
Language:
english
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2012.07.036
Date:
February, 2013
File:
PDF, 921 KB
english, 2013
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