Decreasing reaction rate at the end of silicidation:...

Microelectronic Engineering 2013 / 6 Vol. 106

Decreasing reaction rate at the end of silicidation: In-situ CoSi2 XRD study and modeling

Delattre, R., Simola, R., Rivero, C., Serradeil, V., Perrin-Pellegrino, C., Thomas, O.
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Volume:
106
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.01.003
Date:
June, 2013
File:
PDF, 533 KB
english, 2013
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