Study of etching bias modeling and correction strategies...

Microelectronic Engineering 2013 / 10 Vol. 110

Study of etching bias modeling and correction strategies for compensation of patterning process effects

Ng, Philip C.W., Tsai, Kuen-Yu, Melvin, Lawrence S.
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Volume:
110
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.03.024
Date:
October, 2013
File:
PDF, 1.19 MB
english, 2013
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