Quantitative study on removal of SU-8 photoresist patterns...

Microelectronic Engineering 2013 / 10 Vol. 110

Quantitative study on removal of SU-8 photoresist patterns by supercritical CO2 emulsion

Chang, Tso-Fu Mark, Ishiyama, Chiemi, Sato, Tatsuo, Sone, Masato
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Volume:
110
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.03.137
Date:
October, 2013
File:
PDF, 786 KB
english, 2013
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