Deposition and properties of titanium nitride films...

Vacuum 1995 Vol. 46; Iss. 3

Deposition and properties of titanium nitride films produced by dc reactive magnetron sputtering

Li-Jian Meng, A Azevedo, MP dos Santos
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Volume:
46
Year:
1995
Language:
english
Pages:
7
DOI:
10.1016/0042-207x(94)00052-2
File:
PDF, 605 KB
english, 1995
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