Microstructure and mechanical properties of physical vapor...

Thin Solid Films 2014 / 11 Vol. 571

Microstructure and mechanical properties of physical vapor deposited Cu/W nanoscale multilayers: Influence of layer thickness and temperature

Monclús, M.A., Karlik, M., Callisti, M., Frutos, E., LLorca, J., Polcar, T., Molina-Aldareguía, J.M.
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Volume:
571
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2014.05.044
Date:
November, 2014
File:
PDF, 2.40 MB
english, 2014
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