![](/img/cover-not-exists.png)
Ion-beam etched multi-level resist technique for electroplating of submicron gold absorber patterns
B. Schneider-Gmelch, P. TischerVolume:
2
Year:
1984
Language:
english
Pages:
17
DOI:
10.1016/0167-9317(84)90003-0
File:
PDF, 1.43 MB
english, 1984