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Volume 2; Issue 4
Main
Microelectronic Engineering
Volume 2; Issue 4
Microelectronic Engineering
Volume 2; Issue 4
1
Ion-beam etched multi-level resist technique for electroplating of submicron gold absorber patterns
B. Schneider-Gmelch
,
P. Tischer
Journal:
Microelectronic Engineering
Year:
1984
Language:
english
File:
PDF, 1.43 MB
Your tags:
english, 1984
2
Proximity-effect correction for VLSI patterns in electron-beam lithography
Yasuhide Machida
,
Noriaki Nakayama
,
Sumio Yamamoto
,
Shigeru Furuya
Journal:
Microelectronic Engineering
Year:
1984
Language:
english
File:
PDF, 1.01 MB
Your tags:
english, 1984
3
Feasibility of multi-beam electron lithography
B.J.G.M. Roelofs
,
J.E. Barth
Journal:
Microelectronic Engineering
Year:
1984
Language:
english
File:
PDF, 1.18 MB
Your tags:
english, 1984
4
Frequency tracing and mapping in theory and practice
H.-D. Brust
,
F. Fox
Journal:
Microelectronic Engineering
Year:
1984
Language:
english
File:
PDF, 1.64 MB
Your tags:
english, 1984
5
Contents volume 2 (1984)
Journal:
Microelectronic Engineering
Year:
1984
Language:
english
File:
PDF, 99 KB
Your tags:
english, 1984
6
Editorial
Journal:
Microelectronic Engineering
Year:
1984
Language:
english
File:
PDF, 50 KB
Your tags:
english, 1984
7
Optimization of a chromatically limited ion microprobe
H.N. Slingerland
Journal:
Microelectronic Engineering
Year:
1984
Language:
english
File:
PDF, 430 KB
Your tags:
english, 1984
8
An inorganic resist technology and its applications to LSI fabrication processes
Yasushi Utsugi
,
Akira Yoshikawa
,
Toyoki Kitayama
Journal:
Microelectronic Engineering
Year:
1984
Language:
english
File:
PDF, 1.26 MB
Your tags:
english, 1984
9
Calendar of events
Journal:
Microelectronic Engineering
Year:
1984
Language:
english
File:
PDF, 127 KB
Your tags:
english, 1984
10
Author index volume 2 (1984)
Journal:
Microelectronic Engineering
Year:
1984
Language:
english
File:
PDF, 173 KB
Your tags:
english, 1984
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