Volume 2; Issue 4

Microelectronic Engineering

Volume 2; Issue 4

1

Ion-beam etched multi-level resist technique for electroplating of submicron gold absorber patterns

B. Schneider-Gmelch, P. Tischer

Journal:

Microelectronic Engineering

Year:

1984

Language:

english

File:

PDF, 1.43 MB

english, 1984

2

Proximity-effect correction for VLSI patterns in electron-beam lithography

Yasuhide Machida, Noriaki Nakayama, Sumio Yamamoto, Shigeru Furuya

Journal:

Microelectronic Engineering

Year:

1984

Language:

english

File:

PDF, 1.01 MB

english, 1984

3

Feasibility of multi-beam electron lithography

B.J.G.M. Roelofs, J.E. Barth

Journal:

Microelectronic Engineering

Year:

1984

Language:

english

File:

PDF, 1.18 MB

english, 1984

4

Frequency tracing and mapping in theory and practice

H.-D. Brust, F. Fox

Journal:

Microelectronic Engineering

Year:

1984

Language:

english

File:

PDF, 1.64 MB

english, 1984

5

Contents volume 2 (1984)

Journal:

Microelectronic Engineering

Year:

1984

Language:

english

File:

PDF, 99 KB

english, 1984

6

Editorial

Journal:

Microelectronic Engineering

Year:

1984

Language:

english

File:

PDF, 50 KB

english, 1984

7

Optimization of a chromatically limited ion microprobe

H.N. Slingerland

Journal:

Microelectronic Engineering

Year:

1984

Language:

english

File:

PDF, 430 KB

english, 1984

8

An inorganic resist technology and its applications to LSI fabrication processes

Yasushi Utsugi, Akira Yoshikawa, Toyoki Kitayama

Journal:

Microelectronic Engineering

Year:

1984

Language:

english

File:

PDF, 1.26 MB

english, 1984

9

Calendar of events

Journal:

Microelectronic Engineering

Year:

1984

Language:

english

File:

PDF, 127 KB

english, 1984

10

Author index volume 2 (1984)

Journal:

Microelectronic Engineering

Year:

1984

Language:

english

File:

PDF, 173 KB

english, 1984