Synchrotron radiation lithography applied to fabrication of deep-submicrometer NMOS devices at all exposure levels
A. Yoshikawa, T. Horiuchi, K. Deguchi, M. Miyake, E. Yamamoto, Y. Sakakibara, T. KitayamaVolume:
11
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(90)90104-2
File:
PDF, 360 KB
english, 1990