Volume 11; Issue 1-4

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Microelectronic Engineering
Volume 11; Issue 1-4

Microelectronic Engineering

Volume 11; Issue 1-4

1

Editorial Board

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 31 KB

english, 1990

2

Preface

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 98 KB

english, 1990

3

One dimensional ballistic transport in GaAs microstructures

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 457 KB

english, 1990

4

Thermal transport in free-standing single- crystal GaAs wires

A. Potts, M.J. Kelly, D.G. Hasko, C.G. Smith, J.R.A. Cleaver, H. Ahmed, D.C. Peacock, D.A. Ritchie, J.E.F. Frost, G.A.C. Jones

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 299 KB

english, 1990

5

The fabrication of submicron gated wires on GaAs/AlGaAs heterostructures using low energy Ga ion beam damage

E.H. Linfield, D.A. Ritchie, G.A.C. Jones, J.E.F. Frost, D.C. Peacock, M. Pepper

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 336 KB

english, 1990

6

Fabrication of quantum wires and dots by selective Ga+ implantation enhanced interdiffusion

C. Vieu, M. Schneider, D. Mailly, J.Y. Marzin, B. Descouts

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 364 KB

english, 1990

7

Fabrication of submicron wire networks using electron beam lithography

Richard J. Bojko, Richard Tiberio, Brian Whitehead, Allen M. Goldman, James Gordon, Fang Yu, Paul M. Chaikin, Carlos Wilks, Mark Itzler

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 448 KB

english, 1990

8

Intermixed quantum wires with steep lateral confinement

H. Leier, B.E. Maile, A. Forchel, G. Weimann, W. Schlapp

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 338 KB

english, 1990

9

Preparation of quantum wires and quantum dots by deep mesa etching of A1GaAs-GaAs and InGaAs-InA1As heterostructures

P. Grambow, E. Vasiliadou, T. Demel, K. Kern, D. Heitmann, K. Ploog

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 368 KB

english, 1990

10

Fabrication and high frequency characterisation of GaAs MESFETs with gate lengths down to 30nm.

J.A. Adams, I.G. Thayne, N.I. Cameron, M.R.S. Taylor, S.P. Beaumont, C.D.W. Wilkinson, N.P. Johnson, A.H. Kean, C.R. Stanley

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 337 KB

english, 1990

11

0.15μm E-Beam T-shaped gates for GaAs FETs

A. Chisholm, S. Sainson, M. Feuillade, A. Clei

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 368 KB

english, 1990

12

Fabrication of sub-0.5-micron GaAs Schottky diodes

Yoshizumi Yasuoka, Hiromitsu Takao, Narumi Inoue

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 324 KB

english, 1990

13

Fabrication of high aspect ratio symmetric and asymmetric T-shaped gates for high frequency pseudomorphic HEMTs

E. Lopez, A. Marten, A. Forchel, J.L. Caceres, H. Nickel, W. Schlapp, R. Lösch

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 281 KB

english, 1990

14

High transconductance Al0.3Ga0.7As/GaAs MODFETs

Y. Jin, B. Etienne, F. Pardo, G. Faini, H. Launois

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 455 KB

english, 1990

15

Electron beam lithography of 100 nm T-gates for GaAs MESFETs

B. Wolfstädter, A. Colquhoun, K. Wegener

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 344 KB

english, 1990

16

Holographic photolithography for submicron VLSI structures

J. Brook, R. Daendliker

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 353 KB

english, 1990

17

Heterodyne holographic nanometer alignment for a wafer stepper

N. Nomura, K. Yamashita, K. Kubo, Y. Yamada, M. Suzuki

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 222 KB

english, 1990

18

A comparison of projection and proximity printings —from UV to x-ray

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 636 KB

english, 1990

19

Enhanced I-line resist profiles through the use of an intermediate development bake

N. Samarakone, P. Jaenen, L. Van den hove

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 594 KB

english, 1990

20

Resolution in microlithography

H. Sewell, A.R. Reinberg

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 462 KB

english, 1990

21

Search for the optimum numerical aperture

Christoph Nölscher, Leonhard Mader, Sabine Guttenberger, Wolfgang Arden

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 434 KB

english, 1990

22

Excimer laser induced damage in fused silica

Mordechai Rothschild, Daniel J. Ehrlich, David C. Shaver

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 292 KB

english, 1990

23

Deep uv optics for excimer laser systems

Francis N. Goodall, Ronald A. Lawes, Graham G. Arthur

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 1.05 MB

english, 1990

24

Fabrication of 100nm-period gratings using achromatic holographic lithography

A. Yen, R.A. Ghanbari, E.H. Anderson, Henry I. Smith

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 376 KB

english, 1990

25

Disc lithography and the appearance of poisson's spot in contact printing

P.A.F. Herbert, W.M. Kelly

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 456 KB

english, 1990

26

A catadioptric reduction camera for deep UV microlithography

G. Owen, S.T. Yang, R.L. Hsieh, R.F.W. Pease

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 270 KB

english, 1990

27

Helios: a compact synchrotron X-ray source

MN Wilson, A.I.C. Smith, V.C. Kempson, A.L. Purvis, M.C. Townsend, A.R. Jorden, R.J. Anderson, D.E. Andrews

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 430 KB

english, 1990

28

X-ray lithography at the super-ACO storage ring of Orsay(France)

F. Rousseaux, A.M. Haghiri-Gosnet, C. Khan Malek, B. Kebabi, H. Launois, J. Durand

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 322 KB

english, 1990

29

Synchrotron radiation lithography applied to fabrication of deep-submicrometer NMOS devices at all exposure levels

A. Yoshikawa, T. Horiuchi, K. Deguchi, M. Miyake, E. Yamamoto, Y. Sakakibara, T. Kitayama

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 360 KB

english, 1990

30

An X-ray mask using SiC membrane deposited by ECR plasma CVD

M. Oda, T. Ohkubo, A. Ozawa, S. Ohki, M. Kakuchi, H. Yoshihara

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 265 KB

english, 1990

31

Infrared-measurement of X-ray mask heating during sr-lithography

J. Trube, H.-L. Huber, S. Mourikis, S. Bernstorff, E.E. Koch

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 438 KB

english, 1990

32

X-ray mask technology: Precise etching of sub-half-micron tungsten absorber features

H. Lüthje, A. Bruns, H. Harms, I. Köhler, U. Mescheder, U. Mackens, T. Stuck

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 314 KB

english, 1990

33

Comparison between surface channel PMOS transistors processed with optical and X-ray lithography with regard to X-ray damage

D. Friedrich, H. Bernt, A. Kaatz, F. Naumann, L. Schmidt, W. Windbracke

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 265 KB

english, 1990

34

An alignment system for X-ray lithography

Y. Tanaka, E. Kouno, J. Iwata

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 285 KB

english, 1990

35

Percolation theory and resist development in x-ray lithography

Heinrich K. Oertel, Manfred Weiss, Ralph Dammel, Jürgen Theis

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 385 KB

english, 1990

36

Procedure and results of mask fabrication via X-ray lithography

Jürgen Grimm, Jutta Trube, Hans-Ludwig Huber

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 359 KB

english, 1990

37

Pulse plating of quarter micron gold patterns on silicon X-ray masks

B. Löchel, A. Macioßek, J. Trube, H.-L. Huber

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 369 KB

english, 1990

38

Compact SR light source for x-ray lithography: Aurora

Noriyuki Takahashi

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 415 KB

english, 1990

39

Thermoelastic effects in x-ray lithography masks during synchrotron storage ring irradiation

Y. Vladimirsky, J.R. Maldonado, O. Vladimirsky, F. Cerrina, M. Hansen, R. Nachman, G.M. Wells

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 654 KB

english, 1990

40

Low Stress Tungsten Absorber for X-ray Masks

Y.C. Ku, Henry I. Smith, I. Plotnik

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 441 KB

english, 1990

41

Laser plasma x-ray lithography using novolak resists

M. Chaker, S. Boily, H. Lafontaine, P.P. Mercier, J.F. Currie, J.C. Kieffer, H. Pepin

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 266 KB

english, 1990

42

Optimum operation of the beamwriter[TM] electron gun with independent bias control

Tom Chisholm, Rob Roelofs

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 377 KB

english, 1990

43

Design of a non-equisectored 20-electrode deflector for e-beam lithography using a field emission electron beam

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 371 KB

english, 1990

44

Advances in the electron optical design of a multi e-beam comb probe printer

H. Schäfer, P. Schäffer, S. Kleindiek, K.-H. Herrmann

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 385 KB

english, 1990

45

A 1:1 MIM cathode electron-projection stepper

Armin Delong, Vladmír Kolařik

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 493 KB

english, 1990

46

Sem-voltage contrast as a tool for measurement of circuit parasitics

K.J. Rangra, N.K.L. Raja, V.G. Karkare

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 303 KB

english, 1990

47

Online exposure dose correction during electron beam pattern delineation by blanking pulse width modulation.

N.K.L. Raja, K.J. Rangra, M. Singh

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 271 KB

english, 1990

48

High throughput electron lithography for integrated optoelectronic grating structures

S.J. Clements, R.S. Baulcomb, C.B. Rogers, A.P. Wright, A.S. Gozdz

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 250 KB

english, 1990

49

Resolution limitation in EBL optical grating fabrication on InGaAsP/InP substrate

M. Gentili, A. Lucchesini, L. Grella, G. Meneghini, L. Scopa

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 322 KB

english, 1990

50

Shadow electron beam 1:1 scale printing with 0.1 μm size elements

R.Kh. Makhmutov, K.A. Valiev, L.V. Velikov, V.S. Yakunin

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 465 KB

english, 1990

51

Evaluation of Moiré patterns obtained by the “self-comparison-method” to characterize particle beam lithography systems

H.W.P. Koops, H. Oki, W. Betz, H.J. Huen, R. Zengerle

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 467 KB

english, 1990

52

Microfabrication using focused ion beams

Kenji Gamo, Susumu Namba

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 511 KB

english, 1990

53

Gas-assisted focused ion beam etching for microfabrication and inspection

R.J. Young, J.R.A. Cleaver, H. Ahmed

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 370 KB

english, 1990

54

Focused ion beam machining of mirror facets of a monolithically integrated GaAs/GaAlAs double heterojunction (DH) laser and its optical waveguide.

G.Ben Assayag, P. Sudraud, J. Gierak, D. Remiens, L. Menigaux, L. Dugrand

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 409 KB

english, 1990

55

Experimental study of multiple ion beam machine

M. Ando, M. Matsuzaka, M. Saita

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 443 KB

english, 1990

56

Some improvements on the calculation of emission current in liquid metal ion sources

Cui Zheng, Tong Linsu

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 237 KB

english, 1990

57

A boundary integral method for calculating the field in liquid metal ion sources

Cui Zheng, Tong Linsu

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 251 KB

english, 1990

58

GA+-ion beams on gold: Sputter yields and redeposition

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 409 KB

english, 1990

59

Low stress silicon stencil masks for sub-100 nm ion beam lithography

F.-O. Fong, D.P. Stumbo, S. Sen, G. Damm, D.W. Engler, J.C. Wolfe, J.N. Randall, Philip Mauger, A. Shimkunas

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 435 KB

english, 1990

60

A new positive novalac-based resist for sub-micron ebeam lithography

Asanga H. Perera, J.Peter Krusius

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 345 KB

english, 1990

61

Silylation of three component E-beam resists: application to shipley SAL 601

Thierry G. Vachette, Patrick J. Paniez, Michel Madore

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 399 KB

english, 1990

62

Nanometer pattern fabrication using superficial image emphasis lithography (SIEL)

T. Ishii, S. Moriya, K. Harada

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 230 KB

english, 1990

63

Free volume and relaxation effects in polymer layers: application to the spin coating and bake processes

P. Paniez, M. Pons, O. Joubert

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 324 KB

english, 1990

64

Priming of silicon substrates with trimethylsilyl containing compounds

M.C.B.A. Michielsen, V.B. Marriott, J.J. Ponjée, H. van der Wel, F.J. Touwslager, J.A.H.M. Moonen

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 436 KB

english, 1990

65

Application of positive and negative tone x-ray resist for 0.5μm CMOS device fabrication

U. Mescheder, U. Mackens, H. Lifka, R. Dammel, G. Pawloski, J. Theis

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 477 KB

english, 1990

66

New high resolution and high sensitivity deep UV, x-ray, and electron beam resists

Michael Hatzakis, Kevin J. Stewart, Jane M. Shaw, Stephen A. Rishton

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 208 KB

english, 1990

67

A novel two component positive photoresist for deep UV lithography

Georg Pawlowski, Ralph Dammel, Charlet R. Lindley, Hans-Joachim Merrem, Heinz Röschert, Peter Wilharm

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 426 KB

english, 1990

68

IMRE, BIM and SUPER using patternwise esterification

C.M.J. Mutsaers, F.A. Vollenbroek, W.P.M. Nijssen, R.J. Visser

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 664 KB

english, 1990

69

Silylation of resist materials using di- and polyfunctional organosilicon compounds

E. Babich, J. Paraszczak, D. Witman, R. McGouey, M. Hatzakis, J. Shaw, N. Chou

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 349 KB

english, 1990

70

PRIME process for deep UV and E-beam lithography

C. Pierrat, S. Tedesco, F. Vinet, T. Mourier, M. Lerme, B. Dal'Zotto, J.C. Guibert

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 813 KB

english, 1990

71

Implementation of desire in a 0.5 μm NMOS process

D.N. Nichols, A.M. Goethals, P. De Geyter, L. Van den hove

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 564 KB

english, 1990

72

Profile evolution in the multi-level technique

W. Pilz, J. Pelka, P. Banks

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 410 KB

english, 1990

73

E-beam and duv exposure of RIE PCM two-layer systems

A. Weill, J.P. Avico, J.P. Panabiere, G. Amblard

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 316 KB

english, 1990

74

Chemical amplification of resist lines (CARL)

M. Sebald, R. Sezi, R. Leuschner, H. Ahne, S. Birkle

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 398 KB

english, 1990

75

Aqueous phase silylation a new route to plasma developable high resolution resists

R. Sezi, R. Leuschner, M. Sebald, H. Ahne, S. Birkle, H. Borndörfer

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 304 KB

english, 1990

76

Applications of inorganic resists to sub-micron fabrication

Mino Green, C.J. Aidinis, F. Khaleque, Y. Feng

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 359 KB

english, 1990

77

Optimisation of a pure oxygen, two step dry development technique for the desire process

R. Lombaerts, B. Roland, A. Selino, A.M. Goethals, L. Van Den Hove

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 387 KB

english, 1990

78

A simple bilayer lift-off process

David F. Witman, Jane M. Shaw, Michael Hatzakis, Edward D. Babich, Jurij R. Paraszczak, Kevin J. Stewart

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 318 KB

english, 1990

79

Multilayer resists with variable layer parameters for submicron lithography

V.V. Aristov, V.A. Dmitriyeva, V.A. Kudryashov, K. Pfeiffer, H.-J. Lorkowski

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 323 KB

english, 1990

80

The application of the in-situ dyeing effect to an image reversal resist

D.V. Nicolau, M.V. Dusa

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 273 KB

english, 1990

81

On double layer PMMA resist systems: Development rates and molecular weight distributions of commercial PMMA resists

A.H. Verbruggen, B.G.M. de Lange, B.A.C. Rousseeuw, H.A.H. Billiet, S. Radelaar

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 283 KB

english, 1990

82

Image reversal of diazo-novolak resist by concurrent bake promoted and photoacid catalyzed esterifications

Wen-An Loong, Hwang-Kuen Lin

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 379 KB

english, 1990

83

Application tests of an image reversal resist suitable for G- and I-line exposure

A. Gutmann, G. Czech, H. Lenz, W. Meier

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 498 KB

english, 1990

84

An optimized image reversal process for half-micron lithography

M.E. Reuhman-Huisken, F.A. Vollenbroek

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 438 KB

english, 1990

85

Dry ridge etching of AlGaAs GRINSCH lasers

M. Jost, P. Buchmann, G. Sasso, D. Webb, G.L. Bona, P. Vettiger

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 325 KB

english, 1990

86

Low energy ECR plasma etching with a hybrid magnetic field

N. Fujiwara, K. Nishioka, T. Kato

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 295 KB

english, 1990

87

Evaluation of dry etch damage in nano-structures by direct transmission electron microscopic examination

R. Cheung, A. Birnie, J.N. Chapman, S. Thoms, C.D.W. Wilkinson

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 274 KB

english, 1990

88

CW and time resolved luminescence study of dry etch damage in semiconductor wires

B.E. Maile, G. Mayer, R. Germann, A. Forchel, H.P. Meier

Journal:

Microelectronic Engineering

Year:

1990

File:

PDF, 195 KB

1990

89

High quality plasma planarization: methodology and application to maskless selective interconnection

P. Rabinzohn, C. Villalon, F. Pasqualini, S. Gourrier

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 289 KB

english, 1990

90

Plasma temperatures during reactive ion etching

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 310 KB

english, 1990

91

The effect of CH4/H2 RIE on thin highly doped GaAs layers

N.I. Cameron, S.P. Beaumont, C.D.W. Wilkinson, N.P. Johnson, A.H. Kean, C.R. Stanley

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 298 KB

english, 1990

92

Loading effects in CH4 and H2 Morie of GaAs

V.J. Law, G.A.C. Jones, N.K. Patel, M. Tewordt

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 430 KB

english, 1990

93

Determination of proximity effect correction parameters for 0.1 μm electron-beam lithography

M.G. Rosenfield, S.J. Wind, W.W. Molzen, P.D. Gerber

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 562 KB

english, 1990

94

Simulation of 64 megabit lithography in XRL masks obtained by single-layer process on Si substrates

G. Messina, A. Paoletti, S. Santangelo, A. Tucciarone

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 341 KB

english, 1990

95

Simulation of lithographic images and resist profiles

W. Henke, G. Czech

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 359 KB

english, 1990

96

Application of Monte Carlo modelling to linewidth control for electron beam direct write over device topography

T.A. Fretwell, P.L. Jones

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 418 KB

english, 1990

97

Guaranteed accuracy of the method of ‘simple’ compensation in electron lithography

V.V. Aristov, A.A. Svintsov, S.I. Zaitsev

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 312 KB

english, 1990

98

Computer modelling of resist exposure by focussed ion beams

I.M. Templeton, E.V. Kornelsen

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 472 KB

english, 1990

99

Monte Carlo direct simulation of low energy electron scattering in solids

Z.Y. Tan, P.Y. Qiu, C.J. Song

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 419 KB

english, 1990

100

On-water picosecond e-beam testing applied to complex high-speed IC's

D. Winkler, R. Schmitt, M. Brunner, J.M. Dortu

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 347 KB

english, 1990

101

New calibration method for I.C. dimensional measurements

Jean-Luc Bataillon, Daniel Burlet, Hervé Martin

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 269 KB

english, 1990

102

A method for verifying IC structures and masks

Robert H. Jones

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 299 KB

english, 1990

103

Multilevel CD/overlay metrology using a real-time confocal scanning optical microscope

N.S. Levine, T.R. Corle, R.T. Mumaw, C-H Chou, G.S. Kino

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 426 KB

english, 1990

104

A method to test the accuracy of critical dimension measurement systems (CDMS)

Wolf Malkusch, Thomas Pioch

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 306 KB

english, 1990

105

A SEM-image processing method for recognition and fast location of IC registration marks

N.K.L. Raja, K.J. Rangra

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 427 KB

english, 1990

106

A new test structure for misregistration evaluation

N.N. Kundu, K.I. Arshak, B Lane, J. Geaney, S.N. Gupta

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 263 KB

english, 1990

107

Author index volume II (1990)

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 976 KB

english, 1990

108

Magnetoresistance measurements in microstructured InGaAs/InP wires

A. Menschig, A. Forchel, B. Roos, R. German, W. Heuring, D. Grützmacher

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 297 KB

english, 1990

109

Fabrication of metallic nanoconstrictions

P.A.M. Holweg, J. Caro, A.H. Verbruggen, S. Radelaar

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 369 KB

english, 1990

110

Electronic transport in ballistic structures

R.J. Brown, C.G. Smith, M Pepper, M.J. Kelly, R Newbury, D.G. Hasko, H Ahmed, D.C. Peacock, J.E.F. Frost, D.A. Ritchie, G.A.C. Jones

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 363 KB

english, 1990

111

Microfabrication of GaAs/GaAlAs quantum wires and effect of epitaxial overgrowth on their optical properties.

A. Izrael, J.Y. Marzin, B. Sermage, R. Azoulay, V. Thierry-Mieg

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 526 KB

english, 1990

112

Sub-100 nm electronic devices and quantum-effects research using x-ray nanolithography

Henry I. Smith, K. Ismail, M.L. Schattenburg, D.A. Antoniadis

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 591 KB

english, 1990

113

Experimental verification of the impact of mosfet series resistance on device miniaturization down to source-drain areas as small as 0.2 μm by 0.3 μm

Asanga H. Perera, J. Peter Krusius

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 318 KB

english, 1990

114

0.2 μm T-gate InAlAs/InGaAs MODFET with FT = 170 GHz

I. Adesida, A. Ketterson, J. Laskar, S. Agarwala, T. Brock, J. Kolodzey, H. Morkoc

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 502 KB

english, 1990

115

Silicon micromachining for microsensors and microactuators

Wolfgang Benecke

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 1.13 MB

english, 1990

116

Design and fabrication of a microminiature thermocouple array for far-infrared radiation detection

D.G. Hasko, T.A.S. Srinivas, J.R.A. Cleaver, H. Ahmed

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 360 KB

english, 1990

117

High resolution technology for surface acoustic wave devices monolithically integrated with electronic circuitry

A.J.M. van der Harg, J.H. Visser, E. van der Drift, J. Romijn

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 504 KB

english, 1990

118

OMVPE buried ultrafine periodic structures in GaInAs and InP

T. Yamamoto, E. Inamura, Y. Miyamoto, K. Furuya

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 339 KB

english, 1990

119

Fabrication routes for sub-micron whole-wafer Nb/Al2O3/Nb tunnel junctions

E.C.G. Kirk, D.G. Hasko, M.G. Blamire, J.E. Evetts, H. Ahmed

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 393 KB

english, 1990

120

Patterning of 0.1 μm polysilicon lines by using a negative electron beam resist

J. Barrier, J.P. Miéville, M. Dutoit, Y. Oppliger, J.M. Moret, A. Perret

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 356 KB

english, 1990

121

The coherence of excimer laser radiation in projection photolithography

K.A. Valiev, L.V. Velikov, G.S. Volkov, D.Yu. Zaroslov

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 640 KB

english, 1990

122

ArF quarter-micron projection lithography with an aspherical lens system

N. Nomura, H. Nakagawa, Y. Tani, K. Koga, N. Araki, T. Sato, M. Sasago

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 286 KB

english, 1990

123

0.6 Micron controlled optical lithography on a 0.35NA g-line stepper using surface imaging and dry development by reactive ion etching

Brian Martin, Simon H. Mortimer, Andrew N. Odell, Gordon Thorogood

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 220 KB

english, 1990

124

The impact of thin film interference effects on sub-micron lithography processing.

G.D. Maxwell, A.J.W. Tol, F.A. Vollenbroek, Y.F. Rody

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 440 KB

english, 1990

125

SiC mask membrane for synchrotron radiation lithography

M. Kobayashi, M. Sugawara, K. Yamashiro, Y. Yamaguchi

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 374 KB

english, 1990

126

Influence of X-ray mask repair on pattern placement accuracy

H. Schaffer, U. Mescheder, U. Weigmann, H.-C. Petzold

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 356 KB

english, 1990

127

The effect of SR x-ray lithography on MOS gate oxide and 0.5μm p-channel MOSFET's

U. Mackens, A.J. Walker

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 311 KB

english, 1990

128

Thermoelastic effects on x-ray lithography masks under pulsed irradiation

Iqbal Shareef, Juan R. Maldonado, David Katcoff

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 822 KB

english, 1990

129

Effects of X-ray mask structures and processes on X-ray mask distortion

K. Kondo, M. Yamada, M. Nakaishi, J. Kudo, K. Sugishima

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 267 KB

english, 1990

130

Absence of resolution degradation in X-ray lithography for λ from 4.5nm to 0.83nm

K. Early, M.L. Schattenburg, Henry I. Smith

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 411 KB

english, 1990

131

Possibilities and limits of high speed e-beam submicron lithography

K.D. van der Mest, J.E. Barth, E.H. Mulder

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 476 KB

english, 1990

132

Electron emission from a GaAs avalanche alectron amitting diode

Tom van Zutphen

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 305 KB

english, 1990

133

Fabrication of 25nm wide gold lines using nanometer scale lithography and ionized cluster beam deposition

S.E. Huq, Z.W. Chen, R.A. McMahon, G.A.C. Jones, H. Ahmed

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 335 KB

english, 1990

134

Experimental study on proximity effects in high voltage e-beam lithography

E. Boere, E. van der Drift, J. Romijn, B. Rousseeuw

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 390 KB

english, 1990

135

Pattern distortion in EBP stencil masks

J. Keyser, W. Kulcke

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 350 KB

english, 1990

136

LaB6 electron sources with improved lifetime and brightness for Cambridge EBMF systems

C Dix, PH Loosemore, ME Jones

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 568 KB

english, 1990

137

High-resolution focused ion beam lithography

Shinji Matsui, Yoshikatsu Kojima, Yukinori Ochiai, Toshiyuki Honda, Katsumi Suzuki

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 572 KB

english, 1990

138

Recent developments of focused ion beam implanter

H. Kasahara, H. Sawaragi, R. Mimura, R. Aihara, K. Nakamura, S. Matsui, T. Nozaki, W.B. Thompson, M.H. Shearer

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 301 KB

english, 1990

139

Focused ion beam deposition of carbon for photomask repair

P.J. Heard, P.D. Prewett

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 390 KB

english, 1990

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