An X-ray mask using SiC membrane deposited by ECR plasma CVD
M. Oda, T. Ohkubo, A. Ozawa, S. Ohki, M. Kakuchi, H. YoshiharaVolume:
11
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(90)90106-4
File:
PDF, 265 KB
english, 1990