X-ray mask technology: Precise etching of sub-half-micron tungsten absorber features
H. Lüthje, A. Bruns, H. Harms, I. Köhler, U. Mescheder, U. Mackens, T. StuckVolume:
11
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(90)90109-7
File:
PDF, 314 KB
english, 1990