Comparison between surface channel PMOS transistors processed with optical and X-ray lithography with regard to X-ray damage
D. Friedrich, H. Bernt, A. Kaatz, F. Naumann, L. Schmidt, W. WindbrackeVolume:
11
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(90)90110-f
File:
PDF, 265 KB
english, 1990