Percolation theory and resist development in x-ray lithography
Heinrich K. Oertel, Manfred Weiss, Ralph Dammel, Jürgen TheisVolume:
11
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(90)90112-7
File:
PDF, 385 KB
english, 1990