Evaluation of Moiré patterns obtained by the “self-comparison-method” to characterize particle beam lithography systems
H.W.P. Koops, H. Oki, W. Betz, H.J. Huen, R. ZengerleVolume:
11
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(90)90138-j
File:
PDF, 467 KB
english, 1990