Low stress silicon stencil masks for sub-100 nm ion beam...

Microelectronic Engineering 1990 Vol. 11; Iss. 1-4

Low stress silicon stencil masks for sub-100 nm ion beam lithography

F.-O. Fong, D.P. Stumbo, S. Sen, G. Damm, D.W. Engler, J.C. Wolfe, J.N. Randall, Philip Mauger, A. Shimkunas
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Volume:
11
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(90)90149-n
File:
PDF, 435 KB
english, 1990
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