Application of positive and negative tone x-ray resist for 0.5μm CMOS device fabrication
U. Mescheder, U. Mackens, H. Lifka, R. Dammel, G. Pawloski, J. TheisVolume:
11
Year:
1990
Language:
english
Pages:
5
DOI:
10.1016/0167-9317(90)90155-m
File:
PDF, 477 KB
english, 1990