A novel two component positive photoresist for deep UV...

A novel two component positive photoresist for deep UV lithography

Georg Pawlowski, Ralph Dammel, Charlet R. Lindley, Hans-Joachim Merrem, Heinz Röschert, Peter Wilharm
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Volume:
11
Year:
1990
Language:
english
Pages:
5
DOI:
10.1016/0167-9317(90)90157-o
File:
PDF, 426 KB
english, 1990
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