PRIME process for deep UV and E-beam lithography

Microelectronic Engineering 1990 Vol. 11; Iss. 1-4

PRIME process for deep UV and E-beam lithography

C. Pierrat, S. Tedesco, F. Vinet, T. Mourier, M. Lerme, B. Dal'Zotto, J.C. Guibert
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Volume:
11
Year:
1990
Language:
english
Pages:
8
DOI:
10.1016/0167-9317(90)90160-u
File:
PDF, 813 KB
english, 1990
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