E-beam and duv exposure of RIE PCM two-layer systems
A. Weill, J.P. Avico, J.P. Panabiere, G. AmblardVolume:
11
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(90)90163-n
File:
PDF, 316 KB
english, 1990