Determination of proximity effect correction parameters for 0.1 μm electron-beam lithography
M.G. Rosenfield, S.J. Wind, W.W. Molzen, P.D. GerberVolume:
11
Year:
1990
Language:
english
Pages:
7
DOI:
10.1016/0167-9317(90)90183-t
File:
PDF, 562 KB
english, 1990