Simulation of 64 megabit lithography in XRL masks obtained by single-layer process on Si substrates
G. Messina, A. Paoletti, S. Santangelo, A. TucciaroneVolume:
11
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(90)90184-u
File:
PDF, 341 KB
english, 1990