Avoiding dislocations in ion-implanted silicon
F.W. Saris, J.S. Custer, R.J. Schreutelkamp, R.J. Liefting, R. Wijburg, H. WallingaVolume:
19
Year:
1992
Language:
english
Pages:
6
DOI:
10.1016/0167-9317(92)90453-x
File:
PDF, 631 KB
english, 1992