Comparison of self-aligned silicide technologies for shallow CoSi2-contacts in VLSI-devices
C. Schäffer, D. Depta, L. NiewöhnerVolume:
19
Year:
1992
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(92)90519-w
File:
PDF, 233 KB
english, 1992