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Application of e-beam nanolithography for absorber structuring of high resolution x-ray masks
C. Köhler, W. Brünger, Ch. Ehrlich, H. Huber, K. ReimerVolume:
21
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/0167-9317(93)90047-9
File:
PDF, 402 KB
english, 1993