Volume 21; Issue 1-4

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Microelectronic Engineering
Volume 21; Issue 1-4

Microelectronic Engineering

Volume 21; Issue 1-4

1

Editorial Board

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 83 KB

english, 1993

2

Preface

Heiner Ryssel, Dieter Stephani

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 53 KB

english, 1993

3

Lithography beyond 64Mb

N. Nomura, K. Yamashita, M. Endo, M. Sasago

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 349 KB

english, 1993

4

Photolithography overview for 64 megabit production

T. Leslie, W. Arden, J. Ben-Jacob, D. Coleman, J. Polimeni, F. Prein

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 259 KB

english, 1993

5

213nm lithography

J.M. Hutchinson, W.N. Partlo, R. Hsu, W.G. Oldman

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 342 KB

english, 1993

6

Topographical masks : a new approach to increase the DOF on topographical substrates

Maaike Op de Beeck, Akiko Hisasue, Akira Tokui, Hal Kusunose, Kazuya Kamon, Hiroaki Morimoto

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 402 KB

english, 1993

7

Production-worthy deep UV stepper for 0.35 micron lithography

A. Grassmann, G. Ittner, S. Wittekoek

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 312 KB

english, 1993

8

Advanced i-line lithography: processes for positive and negative patterning using the same acid hardening resist

G. Amblard, A. Weill, C. Stauffer

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 443 KB

english, 1993

9

Focal plane determination for sub-half micron optical steppers

Sunny Stalnaker, Paul Luehrmann, Jacques Waelpoel, Craig Sager, Patrick Reynolds

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 379 KB

english, 1993

10

0.25μm lithography using a deep-UV stepper with annular illumination

A. Yen, W.N. Partlo, R.W. McCleary, M.C. Tipton

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 405 KB

english, 1993

11

Parametric studies of a spectrally narrowed KrF excimer laser for the deep UV stepper

Uday Sengupta, Toshihiko Ishihara, Rick Sandstrom, Chris Reiser

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 284 KB

english, 1993

12

High-precision optical lithography for gate process using an antireflective undercoating and local exposure dose control

Yoshiaki Mimura, Shinji Aoyama

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 431 KB

english, 1993

13

Reduction of linewidth variation for the gate conductor level by lithography based on a new antireflective layer

G. Czech, L. Mader, K.H. Küsters, P. Küppers, A. Gutmann

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 426 KB

english, 1993

14

Optical filtering as an alternative method to phase shifting

R. Hild, G. Nitzsche

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 268 KB

english, 1993

15

The application of sputtered TiN on metallisation layers to optimise available depth-of-field on high NA steppers

B. Martin, D. Gourley

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 391 KB

english, 1993

16

Soft x-ray projection lithography using a high repetition rate laser-induced x-ray source for sub- 100 nanometer lithography processes

E. Louis, F. Bijkerk, L. Shmaenok, H.-J. Voorma, M.J. van der Wiel, R. Schlatmann, J. Verhoeven, E.W.J.M. van der Drift, J. Romijn, B.A.C. Rousseeuw, F. Voβ, R. Desor, B. Nikolaus

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 458 KB

english, 1993

17

Pattern replication accuracy in 1 : 1 SR lithography

T. Tanaka, M. Futagami, M. Morigami, K. Okada, S. Fujiwara, Y. Yamaoka, M. Harada, K. Kaneda, J. Nishino, S. Suzuki

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 396 KB

english, 1993

18

Stress stabilization of tantalum absorbers on x-ray masks

Kazuaki Kondo, Masafumi Nakaishi, Masao Yamada, Masaki Yamabe, Kenji Sugishima

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 279 KB

english, 1993

19

Early operating experience with the helios compact synchrotron x-ray source

D.E. Andrews, C.N. Archie

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 350 KB

english, 1993

20

Pattern placement metrology on x-ray masks

S.C. Nash, C. Bläsing-Bangert, K.-D. Röth

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 241 KB

english, 1993

21

Linewidth control in 1:1 SR lithography

I. Higashikawa, K. Koga, T. Tanaka, M. Morigami, T. Itoh

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 410 KB

english, 1993

22

Electron scattering of diamond membranes in x-ray mask fabrication

G. Messina, A. Paoletti, S. Santangelo, A. Tucciarone

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 344 KB

english, 1993

23

X-ray lithography with efficient picosecond KrF laser-plasma source at 1nm wavelength

I.C.E. Turcu, I.N. Ross, A. Hening, M. Steyer, B. Soom, J.G. Watson, P. Herman

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 522 KB

english, 1993

24

Microfabrication of phase shifting zone plates for hard x-rays

V. White, S. Bajikar, D. Denton, F. Cerrina, B. Lai, W.B. Yun, D. Legnini, Y. Xiao, J. Chrzas, E. DiFabrizio, L. Grella, M. Baciocchi

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 337 KB

english, 1993

25

Transmit: A beamline modelling program

F. Cerrina, F. Baszler, S. Turner, M. Khan

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 352 KB

english, 1993

26

Effect of cylindrical spot shape in gas plasma sources for x-ray lithography

J.R. Maldonado, H.K. Oertel, M. Weiss

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 554 KB

english, 1993

27

Measurement of the effective wavelength of x-ray lithography sources

Juan R. Maldonado, Inna Babich, L.C. Hsia, R. Rippstein, A. Flamholz, Vincent DiMilia

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 317 KB

english, 1993

28

The influence of sloped absorber sidewalls in deep x-ray lithography

J. Schulz, A. El-Kholi, J. Göttert, K. Kadel, J. Mohr

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 395 KB

english, 1993

29

X-ray masks with tungsten absorbers for use in the LIGA process

K. Kadel, W.K. Schomburg, G. Stern

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 369 KB

english, 1993

30

Arrayed miniature electron beam columns

T.H.P. Chang, L.P. Muray, U. Staufer, D.P. Kern

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 758 KB

english, 1993

31

High resolution electron beam lithography and high accuracy overlay using a modified SEM

P.B. Fischer, S.Y. Chou

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 377 KB

english, 1993

32

E-beam correction methods for cell projection optical system

H. Itoh, M. Sasaki, H. Todokoro, Y. Sohda, Y. Nakayama, N. Saitou

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 277 KB

english, 1993

33

Accuracy of exposure during continuous stage movement in a variable shaped vector scanning EB lithography system

T. Kiuchi, A. Yamada, Y. Takahashi, Y. Oae, M. Nakano, J. Kai, H. Yasuda, K. Kawashima

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 257 KB

english, 1993

34

Meeting the pattern definition challenge of 256MBit DRAM x-ray masks

B Koek, R Grant, L Haas, B Jennings, B Wallman

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 533 KB

english, 1993

35

Application of e-beam nanolithography for absorber structuring of high resolution x-ray masks

C. Köhler, W. Brünger, Ch. Ehrlich, H. Huber, K. Reimer

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 402 KB

english, 1993

36

Mark detection in electron beam lithography using evaluation of wave signal symmetry

Genya Matsuoka, Teruo Iwasaki, Hiroyoshi Andou, Yoshinori Minamide

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 290 KB

english, 1993

37

Phase shift mask making by e-beam lithography

H. Elsner, P. Hahmann

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 439 KB

english, 1993

38

Experimental investigation of the resist heating effect in a variably shaped EBL system

S.V. Babin, I. Kostic, P. Hudek

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 349 KB

english, 1993

39

Recent advances in application of focused ion beam technology

J.M. Lindquist, R.J. Young, M.C. Jaehnig

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 553 KB

english, 1993

40

Ion projector distortion stability and wafer exposures under electronic alignment (“pattern lock”) conditions

G. Stengl, G. Bösch, A. Chalupka, J. Fegerl, R. Fischer, G. Lammer, H. Löschner, L. Malek, R. Nowak, C. Traher, P. Wolf

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 350 KB

english, 1993

41

Gallium staining in FIB repair of photomasks

PD Prewett, AW Eastwood, GS Turner, JG Watson

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 407 KB

english, 1993

42

High current FIB system for micromechanics application

L. Bischoff, E. Hesse, G. Hofmann, F.K. Naefring, W. Probst, B. Schmidt, J. Teichert

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 304 KB

english, 1993

43

FIB endpoint detection and depth resolution

R. Hill, J.C. Morgan, R.G. Lee, T. Olson

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 302 KB

english, 1993

44

Design of a 200 kV FIB system with a liquid metal ion source for IC process inspection

R. Mimura, H. Sawaragi, R. Aihara, M. Takai

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 282 KB

english, 1993

45

Focused-ion-beam-induced tungsten deposition for IC repair

F.C. van den Heuvel, M.H.F. Overwijk, E.M. Fleuren, H. Laisina, K.J. Sauer

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 340 KB

english, 1993

46

Soft-error immunity evaluation of DRAM using high-energy nuclear microprobe

H. Sayama, S. Hara, H. Andoh, H. Kimura, Y. Ohno, S. Satoh, M. Takai

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 312 KB

english, 1993

47

Approximation formula for parasitic aberrations due to mechanical defects of an electrostatic deflector

T. Ozaki, Y.H. Hisaoka, H. Murakami

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 243 KB

english, 1993

48

New silicon containing positive resist and its applications for sub-half micron lithography

H.S. Sachdev, J.R. Whitaker, K.G. Sachdev

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 351 KB

english, 1993

49

Resist polarity changes during the silylation process

André Weill, Gilles Amblard, Françoise Debaene, Daniel Sage

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 332 KB

english, 1993

50

Process enhancements for positive tone silylation

G.S. Calabrese, J.F. Bohland, E.K. Pavelchek, R. Sinta, B.W. Dudley, S.K. Jones, P.W. Freeman

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 421 KB

english, 1993

51

Endpoint detection for silylation processes with waveguide modes

H.W.P. Koops, B. Fischer, T. Kerber

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 299 KB

english, 1993

52

Stability of silylated images for application to dry developable deep-UV lithography

A.M. Goethals, K.H. Baik, K. Ronse, L. Van den hove, B. Roland

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 553 KB

english, 1993

53

Newly developed novolak-based resist materials for ion projection lithography (IPL) with structure dimensions of 200-100 nanometers

G. Stangl, E. Cekan, Ch. Eckes, W. Friza, F. Thalinger, A. Bruckner, P. Hudek, W. Fallmann

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 506 KB

english, 1993

54

Melt flow of the silylated areas during the desire process

A. Weill, O. Joubert, P. Paniez, F. Debaene, M. Pons, D. Sage

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 480 KB

english, 1993

55

Patterning of organic layers using negative and positive working top-CARL process

R. Leuschner, H. Ahne, U. Marquardt, U. Nickel, E. Schmidt, M. Sebald, R. Sezi

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 418 KB

english, 1993

56

Enhanced O2 plasma stripping of P+ and Si+ implanted negative resist by H2 plasma pretreatment

Wen-an Loong, Ming-shuo Yen, Fang-chung Wang, Bao-young Hsu, Yue-liang Liu

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 310 KB

english, 1993

57

Characterization of a positive-tone wet silylation process with the AZ 5214TM photoresist

E. Gogolides, K. Yannakopoulou, A.G. Nassiopoulos, E. Tsois, M. Hatzakis

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 283 KB

english, 1993

58

Application aspects of a positive tone deep UV resist

Walter Spiess, Horst Röschert, Horst Wengenroth, Georg Pawlowski

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 391 KB

english, 1993

59

Examination of the solubility and the molecular weight distribution of PMMA in view of an optimised resist system in deep etch x-ray lithography

A. El-Kholi, P. Bley, J. Göttert, J. Mohr

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 276 KB

english, 1993

60

Surface imaging with HMCTS on SAL-resists, a dry developable electron beam process with high sensitivity and good resolution

Thomas Kerber, Hans.W.P. Koops

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 303 KB

english, 1993

61

Reduced photoresist scumming tendencies through the optimization of photoresist formulation parameters

K. Bell, S. Dixit, R. Kautz, T. Koes, R. Lazarus, G. Talor

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 255 KB

english, 1993

62

Single-layer resist for deep, micro- and nanometer structure transfer

P. Hudek, Z. Borkowicz, I. Kostic, I.W. Rangelow, R. Kassing

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 743 KB

english, 1993

63

Use of the Boltzmann transport equation for the evaluation of energy deposition in the case of electron sensitive resist films over composite substrates

I. Raptis, N. Glezos, M. Hatzakis

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 241 KB

english, 1993

64

Evaluation, verification and error determination of proximity parameters α, β and ν in electron beam lithography

S.V. Dubonos, B.N. Gaifullin, H.F. Raith, A.A. Svintsov, S.I. Zaitsev

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 380 KB

english, 1993

65

A novel end point detection technique for in situ development of photoresist

G. Temmel, H. Ryssel

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 265 KB

english, 1993

66

10-nm-wire fabrication in GaAs/AlGaAs MQWs by Cl2 reactive ion beam etching using SiO2 sidewall masks

H. Arimoto, H. Kitada, Y. Sugiyama, A. Tackeuchi, A. Endo, S. Muto

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 356 KB

english, 1993

67

The characteristics of ion beam assisted etching of GaAs by pulsed focused ion beam irradiation

T. Kosugi, H. Iwase, K. Gamo

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 320 KB

english, 1993

68

RIE of sub-50 nm high aspect-ratio pillars, ridges, and trenches in silicon and silicon-germanium

P.B. Fischer, S.Y. Chou

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 351 KB

english, 1993

69

On-line detection and monitoring of plasma etch damage to semi-insulating GaAs

P.A.F. Herbert, M. Murtagh, P.V. Kelly, G.M. Crean, W.M. Kelly

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 457 KB

english, 1993

70

CH4/H2 RIE of InGaAsP/InP materials: An application to DFB laser fabrication

G. Meneghini, L. Boschis, C. Coriasso, A. Stano, M. Gentili, L. Grella, M. Figliomeni

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 312 KB

english, 1993

71

Simulation of time depending particle transport during dry etch process

K. Börnig, J. Pelka

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 302 KB

english, 1993

72

Reactive ion etching and plasma etching of tungsten

P. Verdonck, G. Brasseur, J. Swart

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 313 KB

english, 1993

73

Special angle technique with Ar/O2 - RIBE for the fabrication of steep NM-scale profiles in InGaAsP/InP and subsequent epitaxial overgrowth

J. Hommel, D. Ottenwälder, V. Härle, F. Schneider, A. Menschig, F. Scholz, H. Schweizer

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 461 KB

english, 1993

74

Optical emission spectroscopy of plasma etching of GaAs and InP

VJ Law, GAC Jones, DA Ritchie, M Tewordt

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 253 KB

english, 1993

75

Plasma etching of polysilicon/nitride/polysilicon sandwich structure for sensor applications

Y.X. Li, M. Laros, P.M. Sarro, P.J. French, R.F. Wolffenbuttel

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 283 KB

english, 1993

76

Reactive ion etching of InAlAs with Ar/Cl2 mixtures for ridge waveguide lasers

R. Germann, S. Hausser, J.-P. Reithmaier

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 318 KB

english, 1993

77

Fabrication of wires in silicon germanium material

D.J. Paul, J.R.A. Cleaver, H. Ahmed

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 320 KB

english, 1993

78

Automatic measurement with an electron beam tester

T. Anbe, K. Okubo, H. Teguri, A. Ito

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 264 KB

english, 1993

79

Distortion evaluation of nickel stencil masks with the help of ion proximity exposures and registration measurements on the Leitz LMS- 2000

I.W. Rangelow, V. Lahr, R. Kassing, C. Bläsing-Bangert, K.-D. Röth, G. Bösch, A. Chalupka, R. Fischer, H. Löschner, R. Nowak, C. Traher, G. Stengl, H. Kraus, E. Bayer

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 302 KB

english, 1993

80

Characterization of submicron NMOS devices due to visible light emission

I. Schönstein, J. Müller, U. Hilleringmann, K. Goser

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 290 KB

english, 1993

81

An investigation into the effects of a path length offset on a coherence probe microscope.

G.S Davies, R.J Holwill

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 421 KB

english, 1993

82

Observation of local crystal orientation variation of Al line due to LSI processing by using two-million-volts electron microscope

K. Ura, A. Takaoka, K. Yoshida, J. Wada

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 393 KB

english, 1993

83

Analysis of microstructured samples by focused ion beam sample preparation

L. Frey, W. Ergele, T. Falter, L. Gong, H. Ryssel

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 429 KB

english, 1993

84

Future nanometer electronics

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 574 KB

english, 1993

85

Lateral down-scaling of selective area MOVPE-grown GaInAs/InP wires and dots

H. Rothuizen, P. Roentgen, N. Buchan

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 370 KB

english, 1993

86

Fabrication and performance of 1-dim MODFETs

A. Hülsmann, P. Roman, J. Braunstein, G. Kaufel, K. Köhler, T. Jakobus

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 308 KB

english, 1993

87

Optical studies of barrier modulated InGaAs/GaAs quantum wires

Ch. Gréus, A. Orth, F. Daiminger, L. Butov, J. Straka, A. Forchel

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 389 KB

english, 1993

88

Comparison of the sidewall recombination in dry and wet etched InGaAs/InP wires

B. Jacobs, H. Zull, A. Forchel, I. Gyuro, P. Speier, E. Zielinski, P. Röntgen

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 342 KB

english, 1993

89

Dual-gate nanostructured silicon MOSFETs: fabrication and low temperature characterization

C. de Graaf, J. Caro, K. Heyers, S. Radelaar

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 341 KB

english, 1993

90

Fabrication and characterization of compact 100nm scale metal oxide semiconductor field effect transistors

C.M. Reeves, S.J. Wind, F.J. Hohn, J.J. Bucchignano, Y.T. Lii, D.P. Klaus

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 763 KB

english, 1993

91

Influence of statistical dopant fluctuations on MOS transistors with deep submicron channel lengths

T. Mikolajick, H. Ryssel

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 274 KB

english, 1993

92

Patterning of a Ti/Pt/Au metallization for submicron bipolar transistors made by direct write e-beam lithography

M.N. Webster, A.H. Verbruggen, H.F.F. Jos, J. Romijn, P.M.A. Moors, S. Radelaar

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 417 KB

english, 1993

93

Shallow junction formation by dopant outdiffusion from CoSi2 and its application in sub 0.5μm MOS processes

M. Niazmand, D. Friedrich, W. Windbracke

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 329 KB

english, 1993

94

Fabrication and magnetisation measurements of variable-pitch gratings of cobalt on GaAs

C. Shearwood, H. Ahmed, L.M. Nicholson, J.A.C. Bland, M.J. Baird, M. Patel, H.P. Hughes

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 344 KB

english, 1993

95

Fabrication of Si-coupled three terminal superconducting device using selective deposition of β-W

S.J.M. Bakker, B.A.C. Rousseeuw, E. van der Drift, T.M. Klapwijk, S. Radelaar

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 297 KB

english, 1993

96

Submicron gaps on high mobility Si-MOSFETs: A flexible tool for electron transport studies

S.L. Wang, S. Bakker, T.M. Klapwijk, P.C. van Son

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 321 KB

english, 1993

97

Silicon microsystems

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 1.61 MB

english, 1993

98

Microfabrication of freestanding microstructures

D.F. Moore, A.C.F. Hoole, A. Heaver

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 605 KB

english, 1993

99

Fabrication of magnetic microstructures by using thick layer resists

B. Löchel, A. Maciossek, M. König, H.-L. Huber, G. Bauer

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 532 KB

english, 1993

100

Fabrication of 0.4 μm grid apertures for field-emission array cathodes

D. Peters, W. Bartsch, D. Stephani, C.E. Holland, C.A. Spindt

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 437 KB

english, 1993

101

Design and fabrication of multilevel diffractive optical elements (DOEs) and holographic optical elements (HOEs)

A. Stemmer, H. Zarschizky, E. Knapek, G. Lefranc, H. Scherer-Winner

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 367 KB

english, 1993

102

Integrated circuits on III–V semiconductors a low cost, reliable technology for university environments

W. Patrick, C. Bergamaschi, Hp. Meier

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 385 KB

english, 1993

103

Superconducting submicron bridges fabricated by electron beam lithography and dry etching

W. Langheinrich, B. Spangenberg, R. Barth, H. Kurz

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 393 KB

english, 1993

104

Fabrication of buried InP/InGaAsP waveguide-wires for use in optical beamwidth transformers

A. Kohl, R. Zengerle, H.J. Brückner, H.J. Olzhausen, R. Müller, K. Heime

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 362 KB

english, 1993

105

Author index volume 21

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 851 KB

english, 1993