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Characterization of a positive-tone wet silylation process with the AZ 5214TM photoresist
E. Gogolides, K. Yannakopoulou, A.G. Nassiopoulos, E. Tsois, M. HatzakisVolume:
21
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(93)90069-h
File:
PDF, 283 KB
english, 1993