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Distortion evaluation of nickel stencil masks with the help of ion proximity exposures and registration measurements on the Leitz LMS- 2000
I.W. Rangelow, V. Lahr, R. Kassing, C. Bläsing-Bangert, K.-D. Röth, G. Bösch, A. Chalupka, R. Fischer, H. Löschner, R. Nowak, C. Traher, G. Stengl, H. Kraus, E. BayerVolume:
21
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(93)90091-i
File:
PDF, 302 KB
english, 1993