Simultaneous elimination of electrically active defects in...

Simultaneous elimination of electrically active defects in Si/SiO2 structures by implanted fluorine

V.V. Afanas'ev, M. Depas, J.M.M. de Nijs, P. Balk
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Volume:
22
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(93)90138-u
File:
PDF, 392 KB
english, 1993
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